Volume No. 3 Issue No.: 1 Page No.: 122-128 July-Sept 2008

 

GALVANOSTATIC DEPOSITION AND CORROSION STUDY OF Te CONTAINING CuSe THIN FILMS

 

R.K.Pathak*, Sipi Mohan1 and D.M. Phase2

1. Department of Chemistry, Holkar Science College, Indore (INDIA)
2. UGC-DAE, Consortium for scientific Research, Indore (INDIA)

 

Received on : November 14, 2007

 

ABSTRACT

 

The Te containing CuSe thin films were prepared by electrochemical method. This preparation was carried out galvanostatically at room temperature. The Te containing CuSe thin films were prepared at different compositions of Te. A comparative study of corrosion parameters were done in different electrolytes in the presence and in the absence of inhibitor with the help of Tafel plots. The characterizations of these films were done by Scanning Electron Microscope (SEM) and Energy Dispersive X-Ray Analysis (EDAX).

 

Keywords : Galvanostatic Deposition; Saturated Calomel Electrode (SCE), Scanning Electron Microscope (SEM), Energy Dispersive X-Ray analysis (EDAX), Corrosion Rate (CR), Corrosion Current (Icorr), Corrosion Potential (Vcorr).

 

 

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